Dr. Thomas D. Mantei

Dr. Mantei received his B.S.E.E. from the Massachusetts Institute of Technology in 1962 and the M.S.E.E. and Ph.D. from Stanford University in 1963 and1967, respectively. He joined the University of Cincinnati in 1981, where he is now a Professor of Electrical and Computer Engineering and ECECS Head.

Research Interests

Prof. Mantei is engaged in research projects on plasma assisted semiconductor etching and deposition. Etching research is dedicated to the fabrication of submicron-scale devices with minimal substrate damage. Thin film deposition activity centers on the plasma-enhanced growth of hard dielectric layers, starting with gaseous precursors in a plasma discharge. A key element of this work has been the development of plasma discharge reactors with magnetically enhanced plasma confinement and plasma generation. Applications of these techniques include etching of photovoltaic cells, fabrication of fine scale microelectronic devices, optical waveguide formation, and functional thin films.

Prof. Mantei was selected as Outstanding Professor in Electrical Engineering by the University chapter of Eta Kappa Nu in 1984, 1985, 1990, 1999, and 2000. He has also received the Neil Wandmacher Excellence in Teaching Award given by the College of Engineering and the Student Engineering Tribunal Outstanding Teaching Award. He is a senior member of the IEEE, and is a member of the American Vacuum Society, the American Solar Energy Society, and the Union of Concerned Scientists.

Dr. Mantei is the director of thePlasma Processing Laboratory.

Recent Publications

Plasma-Enhanced Chemical Vapor Deposition of Germanium Films from Tetramethylgermane, Z. G. Xiao and T. D. Mantei, submitted to J. Vac. Sci. Technol. B.

Plasma-Enhanced Deposition of Multilayer Silicon-Containing Coatings for Hardness and Corrosion Resistance, Z. G. Xiao and T. D. Mantei, submitted to Surf. Coat. Technol.

Application-Driven Development of Plasma Source Technology, J. Hopwood and T. D. Mantei, Invited Paper, to appear in J. Vac. Sci. Technol. A, Sept.-Oct. (2003).

Plasma-Enhanced Deposition of Hard Silicon Nitride-Like Coatings from Hexamethyldisiloxane and Ammonia, Z. G. Xiao and T. D. Mantei, Surf. Coat. Technol. 172, 184-188 (2003).

Deposition of Hard Metal Nitride-Like Coatings in an Electron Cyclotron Resonance Discharge, Z. G. Xiao and T. D. Mantei, to appear in Surf. Coat. Technol.

Comparison of Silicon Dioxide Layers Grown from Three Polymethylsiloxane Precursors in a High-Density Oxygen Plasma, Y. Qi, Z. G. Xiao, and T. D. Mantei, to appear in J. Vac. Sci. Technol. A, July-Aug. (2003).

Low Temperature Plasma Deposition of Dielectric Coatings from OrganosiliconPrecursors, C.-T. Lin, F. Li, and T. D. Mantei, J. Vac. Sci. Technol. A17, 735 (1999).

Low Temperature Synthesis of Diamond Films with Electron Cyclotron Resonance Chemical Vapor Deposition, T. D. Mantei, Z. Ring, M. Schweizer, S. Tlali, and H. E. Jackson, Jpn. J. Appl. Phys. 35, 114 (1996).

Plasma Synthesis of Diamond at Low Temperature with a Pulse Modulated Magnetoactive Discharge, Z. Ring, T. D. Mantei, S. Tlali, and H. E. Jackson, Appl. Phys.Lett. 66, 3380 (1996).

Performance and Modeling of a Permanent Magnet Electron Cyclotron Resonance Plasma Source, A. Saproo and T. D. Mantei, J. Vac. Sci. Technol. A 13,883 (1995).

Low Temperature Synthesis of Diamond in a Pulsed Magnetoplasma, Z. Ring, T. D. Mantei, S. Tlali, and H. E. Jackson, J. Vac. Sci. Technol. A 13,1617 (1995).

Parametric Modeling and Measurement of Silicon Etching in a High Density Chlorine Plasma, D. Dane and T. D. Mantei, Appl. Phys. Lett. 65, 478 (1994).

Optimization of Diamond Growth With Statistical Experiment Design in an Electron Cyclotron Resonance Plasma, Z. Ring, T. D. Mantei, A. G. Choo, and H. E. Jackson, Appl. Phys. Lett. 65, 121 (1994).

Evaluation and Control of Device Damage in High Density Plasma Etching, P. K. Gadgil, T. D.Mantei, and X. C. Mu, J. Vac. Sci. Tech. B 12, 102 (1994).

Selective and Uniform High Rate Etching of Polysilicon in a Magnetically Confined Microwave Discharge, P. Gadgil, D. Dane, and T. D. Mantei, J.Vac. Sci. Technol. B11, 216 (1993).

Etching of Polysilicon in a High Density Electron Cyclotron Resonance Plasma with Collimated Magnetic Field, D. Dane, P. Gadgil, T. D. Mantei, M. A.Carlson, and M. E. Weber, J. Vac.Sci. Technol. B 10, 1 (1992).

Diamond Deposition in a Permanent Magnet Microwave Electron Cyclotron Resonance Discharge, T. D. Mantei, and J. J. Chang, J. Vac. Sci. Technol. A 10, 1423(1992).

Effects of Oxygen and Pressure on Diamond Synthesis in a MagnetoactiveMicrowave Discharge, J. J. Chang, T. D. Mantei, R. Vuppuladhadium, andH. E. Jackson, J. Appl. Phys. 71, 2918 (1992).

Substrate Bias Effects on Diamond Synthesis in a Magnetoactive Microwave Plasma, J. J. Chang and T. D. Mantei, J. Appl.Phys. 71, 5724 (1991).

Low Temperature and Low Pressure Diamond Synthesis in a Microwave Electron Cyclotron Resonance Discharge, J. J. Chang, T. D. Mantei, R. Vuppuladhadium , and H. E. Jackson, Appl. Phys. Lett. 59, 1170 (1991).

Plasma Parameter and Etch Measurements in a Multipolar Confined Electron Cyclotron Resonance Discharge, T. D. Mantei and T. E. Ryle, J. Vac. Sci.Technol. B 9, 29 (1991).

Permanent Magnet Electron Cyclotron ResonancePlasma Source, T. D. Mantei and S. Dhole, J. Vac. Sci. Technol. B 9, 26 (1991).

Recent Conference Presentations

Plasma-Enhanced Deposition of Hard Corrosion-Resistant Multilayered Coatings from Organosilicon Precursors, Z. G. Xiao, Yu Qi, and T. D. Mantei, presented at the Int. Conf. Metal Coatings & Thin Films, San Diego (2003).

Pulse-Modulated Plasma Enhanced Deposition of SiO2 Coatings from Octamethyl-cyclotetrasiloxane, Yu Qi and T. D. Mantei, presented at the Int. Conf. Metal Coatings & Thin Films, San Diego (2003).

Deposition of Hard Metal Nitride-Like Coatings in an Electron Cyclotron Resonance Discharge,
Z. G. Xiao and T. D. Mantei, presented at the Int. Conf. Metal Coatings & Thin Films, San Diego (2003).

High-Rate Plasma Deposition of Protective Coatings, C.-T. Lin, F. Li, and T. D. Mantei, presented at the 42nd Annual Tech. Conf., Society of Vacuum Coaters, Chicago (1999).

Basic Concepts of Plasmas and Plasma Damage, invited tutorial presented at the 3rd Plasma Process Induced Damage Conference, Honolulu (1998).

Low Temperature Growth of Protective Coatings in an ECR Plasma, C.-T. Lin, F. Li, and T. D. Mantei, presented at the Am. Vac. Soc. Natl. Symp., Baltimore (1998).

Low Temperature Deposition of Functional Coatings in a High Density Plasma, F. Li, C.-T. Lin, and T. D. Mantei, presented at the 41st Annual Tech. Conf., Society of Vacuum Coaters, Boston (1998).

Low Temperature Synthesis of Diamond Films with ECR Plasma Chemical Vapor Deposition, T. D. Mantei, invited talk presented at the 17th Dry Process Symposium, Tokyo, Japan, (1995).

Introduction to Plasma Etching, T. D. Mantei, invited tutorial presented at the NATO Advanced Study Institute, Chateau de Bonas, France (1995).

High Density Sources for Plasma Etching, T. D. Mantei, invited tutorial presented at the NATO Advanced Study Institute, Chateau de Bonas, France (1995).

Plasma Assisted Deposition of Diamond Films, T. D. Mantei, invited talk presented at the Am. Vac. Soc. Natl. Symp., Denver (1994).

Statistical Optimization of Diamond Growth in a Pulsed Magnetoplasma, Z. Ring, T. D. Mantei, A. G. Choo, and H. E. Jackson, presented at the Fifth Ann. Diamond Technol. Wkshp., Detroit (1994).

Performance of a Permanent Magnet ECR Reactor, A. Saproo, D. Dane, and T. D. Mantei, presented at the Am. Vac. Soc. Natl. Symp., Denver (1994).

Low Temperature Plasma Synthesis of Diamond in a Pulsed Microwave ECR Discharge, Z. Ring, S. Tlali, H. E. Jackson, and T. D. Mantei, presented at the Am. Vac. Soc. Natl. Symp., Denver (1994).

Plysilicon Etch Performance and Damage Evaluation in a High Density ECR Discharge, T. D. Mantei, invited talk presented at the 19th Ann. Tegal Plasma Seminar, San Francisco (1993).

Optimization of Diamond Growth in a Magnetically Enhanced Low Pressure Microwave Discharge, Z. Ring, T. D. Mantei, A. G. Choo, and H. E. Jackson, presented at the Fourth Ann. Diamond Technol. Wkshp., Madison (1993).

Evaluation of Device Damage in Polysilicon Etch Processes, P. K. Gadgil, T. D. Mantei, and X. C. Mu, presented at the Am. Vac. Soc. Natl. Symp., Orlando (1993).

Process Optimization of Plasma Enhanced Chemical Vapor Deposition of Diamond at Low Pressure, Z. Ring, T. D. Mantei, A. G. Choo, and H. E. Jackson, presented at the Am. Vac. Soc. Natl. Symp., Orlando (1993).

Polysilicon Etch Parameter Dependence in a High Density Chlorine Plasma, D. Dane and T. D. Mantei, presented at the Am. Vac. Soc. Natl. Symp., Orlando (1993)

Students

Zhangang Xiao
Yu Qi

RECENT GRADUATES

Chih-Tau Lin - Ph.D. - Plasma Enhanced CVD of Functional Coatings.
Prashant Gadgil - Ph.D. - Characterization of Etch Performance and DeviceDamage in a High Density Electron Cyclotron Resonance Plasma Source, nowat Alcatel.
Zoltan Ring - Ph.D - Process Optimization of Plasma Enhanced Chemical VaporDeposition of Diamond, now at Cree Research.

Last modified: Friday July 2 1999